High permittivity gate dielectric materials
"The book comprehensively covers all the current and the emerging areas of the physics and the technology of high permittivity gate dielectric materials, including, topics such as MOSFET basics and characteristics, hafnium-based gate dielectric materials, Hf-based gate dielectric processing, me...
保存先:
| その他の著者: | |
|---|---|
| フォーマット: | Livre numérique |
| 言語: | Anglais |
| 出版事項: |
Berlin, Heidelberg :
Springer Berlin Heidelberg
[20..].
Cham : Springer Nature |
| 版: | 1st ed. 2013. |
| シリーズ: | Springer Series in Advanced Microelectronics
43 |
| オンライン･アクセス: | Accès sur la plateforme de l'éditeur Accès sur la plateforme Istex Accès Université d'Orléans Accès INSA CVL |
| 注記: |
Archives Springer e-books (Licence nationale) Archives Springer e-books (Licence nationale) |
| Autres localisations: | Voir dans le Sudoc |
| Edition sous un autre format: | • High Permittivity Gate Dielectric Materials, Texte imprimé, 9783642365348 • High Permittivity Gate Dielectric Materials, Texte imprimé, 9783642365362 • High Permittivity Gate Dielectric Materials, Texte imprimé, 9783662501382 |
目次:
- Historical Perspectives High Mobility Channels Non-Volatile Memory Hafnium-Based Gate Dielectric Materials Lanthanum-Based High-K Gate Dielectric Materials Crystalline High-K Gate Dielectric Materials High-K Gate Dielectric Processing.- Metal Gate Electrodes Flat-Band/Threshold Voltage Control Interfaces and Defects Electrical Characterization and Parameter Extraction Non-Contact Metrology of High-K Gate Dielectrics Channel Mobility High-K Gate Dielectric Reliability Issues Bias Temperature Instability Integration Issues.