Defects in high-k gate dielectric stacks : nano-electronic semiconductor devices : [proceedings of the NATO Advanced Research Workshop on defects in advanced high-k dielectric nano-electronic semiconductor devices, St. Petersburg, Russia, July 11-14, 2005]
The goal of this NATO Advanced Research Workshop (ARW) entitled Defects in Advanced High-k Dielectric Nano-electronic Semiconductor Devices , which was held in St. Petersburg, Russia, from July 11 to 14, 2005, was to examine the very complex scientific issues that pertain to the use of advanced high...
Enregistré dans:
| Collectivité auteur: | |
|---|---|
| Autres auteurs: | |
| Format: | Livre numérique |
| Langue: | Anglais |
| Publié: |
Dordrecht :
Springer Netherlands
[20..].
Cham : Springer Nature |
| Édition: | 1st ed. 2006. |
| Collection: | NATO science series. Series II, Mathematics, physics and chemistry
vol. 216 |
| Sujets: | |
| Accès en ligne: | Accès sur la plateforme de l'éditeur Accès sur la plateforme Istex Accès Université d'Orléans Accès INSA CVL |
| Note: |
Archives Springer e-books (Licence nationale) Archives Springer e-books (Licence nationale) |
| Autres localisations: | Voir dans le Sudoc |
| Variante du titre: | Proceedings of the NATO Advanced Research Workshop on Defects in Advanced High-K Dielectric Nano-Electronic Semiconductor Devices, St. Petersburg, Russia, from 11 to 14 July 2005 |
| Edition sous un autre format: | • Defects in high-k gate dielectric stacks, nano-electronic semiconductor devices, edited by Evgeni Gusev, Dordrecht, Springer, 2006, 1 vol. (x, 492 p.), NATO science series, 1-4020-4365-1 |