High permittivity gate dielectric materials

"The book comprehensively covers all the current and the emerging areas of the physics and the technology of high permittivity gate dielectric materials, including, topics such as MOSFET basics and characteristics, hafnium-based gate dielectric materials, Hf-based gate dielectric processing, me...

Description complète

Enregistré dans:
Détails bibliographiques
Autres auteurs: Kar, Samares, 1942- (Directeur de la publication)
Format: Livre numérique
Langue:Anglais
Publié: Berlin, Heidelberg : Springer Berlin Heidelberg [20..].
Cham : Springer Nature
Édition:1st ed. 2013.
Collection:Springer Series in Advanced Microelectronics 43
Accès en ligne:Accès sur la plateforme de l'éditeur
Accès sur la plateforme Istex
Accès Université d'Orléans
Accès INSA CVL
Note: Archives Springer e-books (Licence nationale)
Archives Springer e-books (Licence nationale)
Autres localisations: Voir dans le Sudoc
Edition sous un autre format:• High Permittivity Gate Dielectric Materials, Texte imprimé, 9783642365348
• High Permittivity Gate Dielectric Materials, Texte imprimé, 9783642365362
• High Permittivity Gate Dielectric Materials, Texte imprimé, 9783662501382
Description
Résumé:"The book comprehensively covers all the current and the emerging areas of the physics and the technology of high permittivity gate dielectric materials, including, topics such as MOSFET basics and characteristics, hafnium-based gate dielectric materials, Hf-based gate dielectric processing, metal gate electrodes, flat-band and threshold voltage tuning, channel mobility, high-k gate stack degradation and reliability, lanthanide-based high-k gate stack materials, ternary hafnia and lanthania based high-k gate stack films, crystalline high-k oxides, high mobility substrates, and parameter extraction. Each chapter begins with the basics necessary for understanding the topic, followed by a comprehensive review of the literature, and ultimately graduating to the current status of the technology and our scientific understanding and the future prospects
Description:Archives Springer e-books (Licence nationale)
Archives Springer e-books (Licence nationale)
ISBN:9783642365355
ISSN:2197-6643
Accès:Accès en ligne pour les établissements français bénéficiaires des licences nationales
Accès soumis à abonnement pour tout autre établissement
Conditions particulières de réutilisation pour les bénéficiaires des licences nationales. https://www.licencesnationales.fr/springer-nature-ebooks-contrat-licence-ln-2017