Silicon Devices and Process Integration : Deep Submicron and Nano-Scale Technologies
Silicon Devices and Process Integration is compiled from industrial and academic lecture notes and reflects years of experience in the development of silicon devices. It is prepared specifically for engineers and scientists in semiconductor research, development and manufacturing. It is also suitabl...
Gorde:
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| Formatua: | Livre numérique |
| Hizkuntza: | Anglais |
| Argitaratua: |
New York, NY :
Springer US
2009.
Cham : Springer Nature |
| Sarrera elektronikoa: | Accès sur la plateforme de l'éditeur Accès sur la plateforme Istex Accès Université d'Orléans Accès INSA CVL |
| Oharra: |
Archives Springer e-books (Licence nationale) Archives Springer e-books (Licence nationale) |
| Autres localisations: | Voir dans le Sudoc |
| Edition sous un autre format: | • Silicon Devices and Process Integration, Texte imprimé, 9780387367989 • Phonon scattering in condensed matter VII, proceedings of the seventh International Conference, Cornell University, Ithaca, New York, August 3-7, 1992, ed. M. Meissner, R.O. Pohl, eds, Berlin, Springer, 1993, 1 vol. (XXV-534 p.), Springer series in solid-state sciences, 3-540-56395-4 • Silicon Devices and Process Integration, Texte imprimé, 9781441942241 |
| Gaia: | Silicon Devices and Process Integration is compiled from industrial and academic lecture notes and reflects years of experience in the development of silicon devices. It is prepared specifically for engineers and scientists in semiconductor research, development and manufacturing. It is also suitable for a one-semester course in electrical engineering and materials science at the upper undergraduate or lower graduate level. The book covers both the theoretical and practical aspects of modern silicon devices and the relationship between their electrical properties and processing conditions. Topics covered include: MOS structure, parameter extraction - Short and narrow-channel effects - CMOS mobility enhancement techniques - High-K gate dielectrics, advanced gate stacks - Low-K dielectrics and Cu interconnects - Analog devices and passive components - CMOS and BiCMOS process integration - DRAM, SRAM and NVM cell structures. The book covers state-of-the-art silicon devices and integrated process technologies. It represents a comprehensive discussion of modern silicon devices, their characteristics, and interactions with process parameters. |
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| Alearen deskribapena: | Archives Springer e-books (Licence nationale) Archives Springer e-books (Licence nationale) |
| ISBN: | 9780387690100 |
| Sartu: | Accès en ligne pour les établissements français bénéficiaires des licences nationales Accès soumis à abonnement pour tout autre établissement Conditions particulières de réutilisation pour les bénéficiaires des licences nationales. chttps://www.licencesnationales.fr/springer-nature-ebooks-contrat-licence-ln-2017 |