Design for manufacturability and yield for nano-scale CMOS

As we approach the 32 nm CMOS technology node the design and manufacturing communities are dealing with a lithography system that has to print circuit artifacts that are significantly less than half the wavelength of the light source used, with new materials, with tighter pitches, and higher aspect...

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Đã lưu trong:
Chi tiết về thư mục
Những tác giả chính: Chiang, Charles C., 1958-, Kawa, Jamil (Tác giả)
Định dạng: Livre numérique
Ngôn ngữ:Anglais
Được phát hành: Dordrecht : Springer Netherlands 2007.
Cham : Springer Nature
Loạt:Series on Integrated Circuits and Systems
Truy cập trực tuyến:Accès sur la plateforme de l'éditeur
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Accès Université d'Orléans
Accès INSA CVL
Chú thích: Archives Springer e-books (Licence nationale)
Archives Springer e-books (Licence nationale)
Autres localisations: Voir dans le Sudoc
Edition sous un autre format:• Design for Manufacturability and Yield for Nano-Scale CMOS, Texte imprimé, 9789048173037
• Design for Manufacturability and Yield for Nano-Scale CMOS, Texte imprimé, 9789048110216
• Design for Manufacturability and Yield for Nano-Scale CMOS, Texte imprimé, 9781402051876

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