Design for manufacturability and yield for nano-scale CMOS
As we approach the 32 nm CMOS technology node the design and manufacturing communities are dealing with a lithography system that has to print circuit artifacts that are significantly less than half the wavelength of the light source used, with new materials, with tighter pitches, and higher aspect...
Tallennettuna:
| Päätekijät: | , |
|---|---|
| Aineistotyyppi: | Livre numérique |
| Kieli: | Anglais |
| Julkaistu: |
Dordrecht :
Springer Netherlands
2007.
Cham : Springer Nature |
| Sarja: | Series on Integrated Circuits and Systems
|
| Linkit: | Accès sur la plateforme de l'éditeur Accès sur la plateforme Istex Accès Université d'Orléans Accès INSA CVL |
| Huomautus: |
Archives Springer e-books (Licence nationale) Archives Springer e-books (Licence nationale) |
| Autres localisations: | Voir dans le Sudoc |
| Edition sous un autre format: | • Design for Manufacturability and Yield for Nano-Scale CMOS, Texte imprimé, 9789048173037 • Design for Manufacturability and Yield for Nano-Scale CMOS, Texte imprimé, 9789048110216 • Design for Manufacturability and Yield for Nano-Scale CMOS, Texte imprimé, 9781402051876 |