Interconnect noise optimization in nanometer technologies
Interconnect has become the dominating factor in determining system performance in nanometer technologies. Dedicated to this subject, Interconnect Noise Optimization in Nanometer Technologies provides insight and intuition into layout analysis and optimization for interconnect in high speed, high co...
Enregistré dans:
| Auteurs principaux: | , |
|---|---|
| Format: | Livre numérique |
| Langue: | Anglais |
| Publié: |
New York, NY :
Springer US
2006.
Cham : Springer Nature |
| Accès en ligne: | Accès sur la plateforme de l'éditeur Accès sur la plateforme Istex Accès Université d'Orléans Accès INSA CVL |
| Note: |
Archives Springer e-books (Licence nationale) Archives Springer e-books (Licence nationale) |
| Autres localisations: | Voir dans le Sudoc |
| Edition sous un autre format: | • Interconnect Noise Optimization in Nanometer Technologies, Texte imprimé, 9781441938442 • Interconnect Noise Optimization in Nanometer Technologies, Texte imprimé, 9780387507163 • Interconnect Noise Optimization in Nanometer Technologies, Texte imprimé, 9780387258706 |
Table des matières:
- Noise Analysis and Design in Deep Submicron
- Interconnect Noise Analysis and Optimization Techniques
- Crosstalk Noise Analysis in Ultra Deep Submicrometer Technologies
- Minimum Area Shield Insertion for Inductive Noise Reduction
- Spacing Algorithms for Crosstalk Noise Reduction
- Post Layout Interconnect Optimization for Crosscoupling Noise Reduction
- 3D Integration
- EDA Industry Tools: State of the ART.