Interconnect noise optimization in nanometer technologies
Interconnect has become the dominating factor in determining system performance in nanometer technologies. Dedicated to this subject, Interconnect Noise Optimization in Nanometer Technologies provides insight and intuition into layout analysis and optimization for interconnect in high speed, high co...
Guardado en:
| Autores principales: | , |
|---|---|
| Formato: | Livre numérique |
| Lenguaje: | Anglais |
| Publicado: |
New York, NY :
Springer US
2006.
Cham : Springer Nature |
| Acceso en línea: | Accès sur la plateforme de l'éditeur Accès sur la plateforme Istex Accès Université d'Orléans Accès INSA CVL |
| Nota: |
Archives Springer e-books (Licence nationale) Archives Springer e-books (Licence nationale) |
| Autres localisations: | Voir dans le Sudoc |
| Edition sous un autre format: | • Interconnect Noise Optimization in Nanometer Technologies, Texte imprimé, 9781441938442 • Interconnect Noise Optimization in Nanometer Technologies, Texte imprimé, 9780387507163 • Interconnect Noise Optimization in Nanometer Technologies, Texte imprimé, 9780387258706 |
| LEADER | 03276nam a22003377a 4500 | ||
|---|---|---|---|
| 001 | 937849 | ||
| 008 | 080410s2006 xx ||| |||| 00| 0 eng d | ||
| 009 | PPN123107113 | ||
| 020 | |a 9780387293660 | ||
| 041 | 0 | |a eng | |
| 082 | |a 621.3815 | ||
| 100 | 1 | |a Elgamel, Mohamed A. | |
| 245 | 1 | 0 | |a Interconnect noise optimization in nanometer technologies |c by Mohamed A. Elgamel, Magdy A. Bayoumi. |
| 260 | |a New York, NY : |b Springer US. | ||
| 260 | |a Cham : |b Springer Nature, |c 2006. | ||
| 500 | |a Archives Springer e-books (Licence nationale) | ||
| 500 | |a Archives Springer e-books (Licence nationale) | ||
| 505 | 0 | |a Noise Analysis and Design in Deep Submicron -- Interconnect Noise Analysis and Optimization Techniques -- Crosstalk Noise Analysis in Ultra Deep Submicrometer Technologies -- Minimum Area Shield Insertion for Inductive Noise Reduction -- Spacing Algorithms for Crosstalk Noise Reduction -- Post Layout Interconnect Optimization for Crosscoupling Noise Reduction -- 3D Integration -- EDA Industry Tools: State of the ART. | |
| 506 | |a Accès en ligne pour les établissements français bénéficiaires des licences nationales | ||
| 506 | |a Accès soumis à abonnement pour tout autre établissement | ||
| 506 | |a Conditions particulières de réutilisation pour les bénéficiaires des licences nationales. chttps://www.licencesnationales.fr/springer-nature-ebooks-contrat-licence-ln-2017 | ||
| 520 | |a Interconnect has become the dominating factor in determining system performance in nanometer technologies. Dedicated to this subject, Interconnect Noise Optimization in Nanometer Technologies provides insight and intuition into layout analysis and optimization for interconnect in high speed, high complexity integrated circuits. The authors bring together a wealth of information presenting a range of CAD algorithms and techniques for synthesizing and optimizing interconnect. Practical aspects of the algorithms and the models are explained with sufficient details. The book investigates the most effective parameters in layout optimization. Different post-layout optimization techniques with complexity analysis and benchmarks tests are provided. The impact crosstalk noise and coupling on the wire delay is analyzed. Parameters that affect signal integrity are also considered. | ||
| 700 | 1 | |a Bayoumi, Magdy A. |4 aut | |
| 776 | 0 | |t Interconnect Noise Optimization in Nanometer Technologies |b Texte imprimé |z 9781441938442 | |
| 776 | 0 | |t Interconnect Noise Optimization in Nanometer Technologies |b Texte imprimé |z 9780387507163 | |
| 776 | 0 | |t Interconnect Noise Optimization in Nanometer Technologies |b Texte imprimé |z 9780387258706 | |
| 856 | 4 | |q PDF |u https://doi.org/10.1007/0-387-29366-3 |z Accès sur la plateforme de l'éditeur | |
| 856 | 4 | |u https://revue-sommaire.istex.fr/ark:/67375/8Q1-2B1P1NXH-6 |z Accès sur la plateforme Istex | |
| 856 | 4 | |5 452349901:747906300 |u https://ezproxy.univ-orleans.fr/login?url=https://doi.org/10.1007/0-387-29366-3 |z Accès Université d'Orléans | |
| 856 | 4 | |5 180339901:750919418 |u https://ezproxy.insa-cvl.fr/login?qurl=https://doi.org/10.1007/0-387-29366-3 |z Accès INSA CVL | |
| 997 | |0 937849 |1 Livre numérique |a Ressource numérique |b INSA |b ENSA |c 0/Bibliothèque numérique/ |c 1/Bibliothèque numérique/Autre ressource numérique/ | ||