Nanofabrication : Techniques and Principles
Intended to update scientists and engineers on the current state of the art in a variety of key techniques used extensively in the fabrication of structures at the nanoscale. The present work covers the essential technologies for creating sub 25 nm features lithographically, depositing layers with n...
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| Altres autors: | , |
|---|---|
| Format: | Livre numérique |
| Idioma: | Anglais |
| Publicat: |
Vienna :
Springer Vienna
2012.
Cham : Springer Nature |
| Accés en línia: | Accès sur la plateforme de l'éditeur Accès sur la plateforme Istex Accès Université d'Orléans Accès INSA CVL |
| Nota: |
Archives Springer e-books (Licence nationale) Archives Springer e-books (Licence nationale) |
| Autres localisations: | Voir dans le Sudoc |
| Edition sous un autre format: | • Nanofabrication, Texte imprimé, 9783709104231 |
| LEADER | 03149nam a22003137a 4500 | ||
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| 041 | 0 | |a eng | |
| 082 | |a 620.115 | ||
| 245 | 0 | 0 | |a Nanofabrication : |b Techniques and Principles |c edited by Maria Stepanova, Steven Dew. |
| 260 | |a Vienna : |b Springer Vienna. | ||
| 260 | |a Cham : |b Springer Nature, |c 2012. | ||
| 500 | |a Archives Springer e-books (Licence nationale) | ||
| 500 | |a Archives Springer e-books (Licence nationale) | ||
| 505 | 1 | |a 1 Introduction Directions in Nanofabrication 2 Nanolithography Fundamentals of Electron Beam Exposure and Development Simulation of Electron Beam Exposure and Resist Processing for Nano-Patterning Helium Ion Lithography Nanoimprint Technologies 3 Deposition at the Nanoscale Atomic Layer Deposition for Nanotechnology Surface Functionalization in the Nanoscale Domain Nanostructures Based on Self-Assembly of Block Copolymers Epitaxial Growth of Metals on Semiconductors Via Electrodeposition 4 Nanoscale Etching and Patterning Chemical Mechanical Polish for Nanotechnology Deposition, Milling, and Etching with a Focused Helium Ion Beam Laser Nanopatterning Templating and Pattern Transfer Using Anodized Nanoporous Alumina/Titania. | |
| 506 | |a Accès en ligne pour les établissements français bénéficiaires des licences nationales | ||
| 506 | |a Accès soumis à abonnement pour tout autre établissement | ||
| 506 | |a Conditions particulières de réutilisation pour les bénéficiaires des licences nationales. https://www.licencesnationales.fr/springer-nature-ebooks-contrat-licence-ln-2017 | ||
| 520 | |a Intended to update scientists and engineers on the current state of the art in a variety of key techniques used extensively in the fabrication of structures at the nanoscale. The present work covers the essential technologies for creating sub 25 nm features lithographically, depositing layers with nanometer control, and etching patterns and structures at the nanoscale. A distinguishing feature of this book is a focus not on extension of microelectronics fabrication, but rather on techniques applicable for building NEMS, biosensors, nanomaterials, photonic crystals, and other novel devices and structures that will revolutionize society in the coming years | ||
| 700 | 1 | |a Stepanova, Maria, |d 19..-...., |c chercheuse. |4 edt | |
| 700 | 1 | |a Dew, Steven. |4 edt | |
| 776 | 0 | |t Nanofabrication |b Texte imprimé |z 9783709104231 | |
| 856 | 4 | |q PDF |u https://doi.org/10.1007/978-3-7091-0424-8 |z Accès sur la plateforme de l'éditeur | |
| 856 | 4 | |u https://revue-sommaire.istex.fr/ark:/67375/8Q1-NGVBS214-W |z Accès sur la plateforme Istex | |
| 856 | 4 | |5 452349901:750605995 |u https://ezproxy.univ-orleans.fr/login?url=https://doi.org/10.1007/978-3-7091-0424-8 |z Accès Université d'Orléans | |
| 856 | 4 | |5 180339901:753965836 |u https://ezproxy.insa-cvl.fr/login?qurl=https://doi.org/10.1007/978-3-7091-0424-8 |z Accès INSA CVL | |
| 997 | |0 973937 |1 Livre numérique |a Ressource numérique |b INSA |b ENSA |c 0/Bibliothèque numérique/ |c 1/Bibliothèque numérique/Autre ressource numérique/ | ||