Nanoimprint lithography : an enabling process for nanofabrication
Nanoimprint Lithography: An enabling process for nanofabrication presents a comprehensive description of nanotechnology that is one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures, and an emerging lithography candidates for 22, 16 and 11 nm nodes. It pro...
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| Autor principal: | |
|---|---|
| Formato: | Livre numérique |
| Idioma: | Anglais |
| Publicado em: |
Berlin, Heidelberg :
Springer Berlin Heidelberg
2013.
Cham : Springer Nature |
| Acesso em linha: | Accès sur la plateforme de l'éditeur Accès sur la plateforme Istex Accès Université d'Orléans Accès INSA CVL |
| Nota: |
Archives Springer e-books (Licence nationale) Archives Springer e-books (Licence nationale) |
| Autres localisations: | Voir dans le Sudoc |
| Edition sous un autre format: | • Nanoimprint Lithography: An Enabling Process for Nanofabrication, Texte imprimé, 9783642344275 |
Sumário:
- Principles and statues of nanoimprint lithography Stamp Fabrication stamp surface treatment Nanoimprint lithography resists Nanoimprint lithography process Modeling and Simulation of NIL Application of NIL in Light emitting Diodes Application of NIL in memory devices Application of NIL in solar cell