Precursor Chemistry of Advanced Materials : CVD, ALD and Nanoparticles
Material synthesis by the transformation of organometallic compounds (precursors) by vapor deposition techniques such as chemical vapor deposition (CVD) and atomic layer deposition (ALD) has been in the forefront of modern day research and development of new materials. There exists a need for new ro...
Enregistré dans:
| Auteur principal: | |
|---|---|
| Format: | Livre numérique |
| Langue: | Anglais |
| Publié: |
Berlin, Heidelberg :
Springer Berlin Heidelberg
[20..].
Cham : Springer Nature |
| Édition: | 1st ed. 2005. |
| Collection: | Topics in Organometallic Chemistry
9 |
| Accès en ligne: | Accès sur la plateforme de l'éditeur Accès sur la plateforme Istex Accès Université d'Orléans Accès INSA CVL |
| Note: |
Archives Springer e-books (Licence nationale) Archives Springer e-books (Licence nationale) |
| Autres localisations: | Voir dans le Sudoc |
| Edition sous un autre format: | • Precursor chemistry of advanced materials, CVD, ALD and nanoparticles, [edited by] R.A. Fischer, New York, NY, Springer, 2005, 1 vol. (XV-213 p.), Topics in organometallic chemistry, 3-540-01605-8 • Precursor Chemistry of Advanced Materials, Texte imprimé, 9783642056888 • Precursor Chemistry of Advanced Materials, Texte imprimé, 9783540800149 • Precursor chemistry of advanced materials, CVD, ALD and nanoparticles, [edited by] R.A. Fischer, New York, NY, Springer, 2005, 1 vol. (XV-213 p.), Topics in organometallic chemistry, 3-540-01605-8 |
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| 100 | 1 | |a Fischer, Roland A. | |
| 245 | 1 | 0 | |a Precursor Chemistry of Advanced Materials : |b CVD, ALD and Nanoparticles |c edited by Roland A. Fischer. |
| 250 | |a 1st ed. 2005. | ||
| 260 | |a Berlin, Heidelberg : |b Springer Berlin Heidelberg. | ||
| 260 | |a Cham : |b Springer Nature, |c [20..]. | ||
| 490 | 0 | |a Topics in Organometallic Chemistry |v 9 |x 1616-8534 | |
| 500 | |a Archives Springer e-books (Licence nationale) | ||
| 500 | |a Archives Springer e-books (Licence nationale) | ||
| 505 | 1 | |a M.D. Allendorf, A.M.B. van Mol: Gas-Phase Thermochemistry and Mechanism of Organometallic Tin Oxide CVD Precursors A. Devi, R.A. Fischer, J. Müller and R. Schmid: Materials Chemistry of Group-13 Nitrides M. Veith, S. Mathur: Single-Source-Precursor CVD: Alkoxy and Siloxy Aluminum Hydrides S. Schulz: CVD Deposition of Binary AlSb and GaSb Material Films - A Single-Source Approach M. Putkonen, L. Niinistö: Organometallic Precursors For Atomic Layer Deposition Ph. Serp, J.-C. Hierso and Ph. Kalck: Surface Reactivity of Transition Metal CVD Precursors: towards the Control of the Nucleation Step M.A. Malik and P. O'Brien: Organometallic and Metal-organic Precursors for Nanoparticles | |
| 506 | |a Accès en ligne pour les établissements français bénéficiaires des licences nationales | ||
| 506 | |a Accès soumis à abonnement pour tout autre établissement | ||
| 506 | |a Conditions particulières de réutilisation pour les bénéficiaires des licences nationales. https://www.licencesnationales.fr/springer-nature-ebooks-contrat-licence-ln-2017 | ||
| 520 | |a Material synthesis by the transformation of organometallic compounds (precursors) by vapor deposition techniques such as chemical vapor deposition (CVD) and atomic layer deposition (ALD) has been in the forefront of modern day research and development of new materials. There exists a need for new routes for designing and synthesizing new precursors as well as the application of established molecular precursors to derive tuneable materials for technological demands. With regard to the precursor chemistry, a most detailed understanding of the mechanistic complexity of materials formation from molecular precursors is very important for further development of new processes and advanced materials. To emphasize and stimulate research in these areas, this volume comprises a selection of case studies covering various key-aspects of the interplay of precursor chemistry with the process conditions of materials formation, particularly looking at the similarities and differences of CVD, ALD and nanoparticle synthesis, e.g. colloid chemistry, involving tailored molecular precursors | ||
| 700 | 1 | |a Fischer, Roland A. |4 edt | |
| 776 | 0 | |0 092213537 |t Precursor chemistry of advanced materials |o CVD, ALD and nanoparticles |f [edited by] R.A. Fischer |c New York, NY |n Springer |d 2005 |p 1 vol. (XV-213 p.) |s Topics in organometallic chemistry |z 3-540-01605-8 | |
| 776 | 0 | |t Precursor Chemistry of Advanced Materials |b Texte imprimé |z 9783642056888 | |
| 776 | 0 | |t Precursor Chemistry of Advanced Materials |b Texte imprimé |z 9783540800149 | |
| 776 | 0 | |0 092213537 |t Precursor chemistry of advanced materials |o CVD, ALD and nanoparticles |f [edited by] R.A. Fischer |c New York, NY |n Springer |d 2005 |p 1 vol. (XV-213 p.) |s Topics in organometallic chemistry |z 3-540-01605-8 | |
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