Precursor Chemistry of Advanced Materials : CVD, ALD and Nanoparticles
Material synthesis by the transformation of organometallic compounds (precursors) by vapor deposition techniques such as chemical vapor deposition (CVD) and atomic layer deposition (ALD) has been in the forefront of modern day research and development of new materials. There exists a need for new ro...
Enregistré dans:
| Auteur principal: | |
|---|---|
| Format: | Livre numérique |
| Langue: | Anglais |
| Publié: |
Berlin, Heidelberg :
Springer Berlin Heidelberg
[20..].
Cham : Springer Nature |
| Édition: | 1st ed. 2005. |
| Collection: | Topics in Organometallic Chemistry
9 |
| Accès en ligne: | Accès sur la plateforme de l'éditeur Accès sur la plateforme Istex Accès Université d'Orléans Accès INSA CVL |
| Note: |
Archives Springer e-books (Licence nationale) Archives Springer e-books (Licence nationale) |
| Autres localisations: | Voir dans le Sudoc |
| Edition sous un autre format: | • Precursor chemistry of advanced materials, CVD, ALD and nanoparticles, [edited by] R.A. Fischer, New York, NY, Springer, 2005, 1 vol. (XV-213 p.), Topics in organometallic chemistry, 3-540-01605-8 • Precursor Chemistry of Advanced Materials, Texte imprimé, 9783642056888 • Precursor Chemistry of Advanced Materials, Texte imprimé, 9783540800149 • Precursor chemistry of advanced materials, CVD, ALD and nanoparticles, [edited by] R.A. Fischer, New York, NY, Springer, 2005, 1 vol. (XV-213 p.), Topics in organometallic chemistry, 3-540-01605-8 |