Science and technology of semiconductor-on-insulator structures and devices operating in a harsh environment

This proceedings volume archives the contributions of the speakers who attended the NATO Advanced Research Workshop on Science and Technology of Semiconductor-On-Insulator Structures and Devices Operating in a Harsh Environment held at the Sanatorium Puscha Ozerna, th th Kyiv, Ukraine, from 25 to 29...

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Yhteisötekijä: NATO Advanced Research Workshop on Science and Technology of Semiconductor-On-Insulator Structures and Devices Operating in a Harsh Environment (Tekijä)
Muut tekijät: Flandre, Denis (Päätoimittaja), Nazarov, Alexei N. (Päätoimittaja), Hemment, Peter LF (Päätoimittaja)
Aineistotyyppi: Livre numérique
Kieli:Anglais
Julkaistu: Dordrecht : Springer Netherlands [20..].
Cham : Springer Nature
Painos:1st ed. 2005.
Sarja:NATO Science Series II: Mathematics, Physics and Chemistry, Mathematics, Physics and Chemistry 185
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Huomautus: Papers from the NATO Advanced Research Workshop on Science and Technology of Semiconductor-on-Insulator Structures and Devices Operating in a Harsh Environment
L'impression du document génère X-348 p.
Archives Springer e-books (Licence nationale)
Archives Springer e-books (Licence nationale)
Autres localisations: Voir dans le Sudoc
Edition sous un autre format:• Science and technology of semiconductor-on-insulator structures and devices operating in a harsh environment, edited by Denis Flandre, Alexei N. Nazarov and Peter L.F. Hemment, Dordrecht, Kluwer Academic in cooperation with NATO Scientific Affairs Division, 2005, 1 vol. (X-348 p.), NATO science series, 1-402-03011-8
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082 |a 621.38152 
245 0 0 |a Science and technology of semiconductor-on-insulator structures and devices operating in a harsh environment   |c edited by Denis Flandre, Alexei N. Nazarov and Peter L.F. Hemment. 
250 |a 1st ed. 2005. 
260 |a Dordrecht :  |b Springer Netherlands. 
260 |a Cham :  |b Springer Nature,  |c [20..]. 
490 0 |a NATO Science Series II: Mathematics, Physics and Chemistry, Mathematics, Physics and Chemistry  |v 185 
500 |a Papers from the NATO Advanced Research Workshop on Science and Technology of Semiconductor-on-Insulator Structures and Devices Operating in a Harsh Environment 
500 |a L'impression du document génère X-348 p. 
500 |a Archives Springer e-books (Licence nationale) 
500 |a Archives Springer e-books (Licence nationale) 
504 |a Notes bibliogr. Index 
505 1 |a Technology and Economics High Temperature Electronics - Cluster Effects On the Evolution of SOI Materials and Devices SOI Technology as a Basis for Microphotonic-Microelectronic Integrated Devices SOI Material Technologies Smart Cut Technology: The Path for Advanced SOI Substrates Porous Silicon Based SOI: History and Prospects Achievement of SiGe-on-Insulator Technology CVD Diamond Films for SOI Technologies Radical Beam Quasiepitaxy Technology for Fabrication of Wide-Gap Semiconductors on Insulator Impact of Hydrostatic Pressure during Annealing of Si:O on Creation of Simox - Like Structures SiO2 and Si3N4 Phase Formation by Ion Implantation with In-Situ Ultrasound Treatment Fabrication and Characterisation of Silicon on Insulator Substrates Incorporating Thermal Vias Reliability and Operation of SOI Devices in Harsh Environment Reliability and Electrical Fluctuations in Advanced SOI CMOS Devices Hydrogen and High-Temperature Charge Instability of SOI Structures and MOSFETs Recent Advances in SOI MOSFET Devices and Circuits for Ultra-Low Power / High Temperature Applications Silicon-on-Insulator Circuits for Application at High Temperatures High-Voltage SOI Devices for Automotive Applications Heat Generation Analysis in SOI LDMOS Power Transistors Novel SOI MOSFET Structure for Operation over a Wide Range of Temperatures MOSFETs Scaling Down: Advantages and Disadvantages for High Temperature Applications Temperature Dependence of RF Losses in High-Resistivity SOI Substrates Radiation Effects Review of Radiation Effects in Single and Multiple-Gate SOI MOSFETs Radiation Effects in SOI: Irradiation by High Energy Ions and Electrons Radiation Characteristics of Short P- Channel MOSFETs on SOI Substrates Total Dose Behavior of Partially Depleted Delecut SOI MOSFETs Radiation Effect on Electrical Properties of Fully-Depleted Unibond SOI MOSFETs Characterization and Simulation of SOI Devices Operating under Harsh Environment Low Cost High Temperature Test System for SOI Devices Characterization of Carrier Generation in Thin-Film SOI Devices by Reverse Gated-Diode Technique and its Application at High Temperatures Back-Gate Induced Noise Overshoot in Partially-Depleted SOI MOSFETs Novel SOI Devices and Sensors Operating at Harsh Conditions SiGe Heterojunction Bipolar Transistors on Insulating Substrates Silicon-on-Insulator Substrates with Buried Ground Planes (GPSOI) High-Voltage High-Current DMOS Transistor Compatible with High-Temperature Thin-Film SOI CMOS Applications A Novel Low Leakage EEPROM Cell for Application in an Extended Temperature Range (?40ů Up to 225ů) Design, Fabrication and Characterization of SOI Pixel Detectors of Ionizing Radiation Polysilicon-on-Insulator Layers at Cryogenic Temperatures and High Magnetic Fields Planar Photomagnetic Effect SOI Sensors for Various Applications with Low Detection Limit Theoretical Limit for the SiO2 Thickness in Silicon MOS Devices Compact Model of the Nanoscale Gate-All-Around MOSFET Self-Assembled Semiconductor Nanowires on Silicon and Insulating Substrates: Experimental Behavior Fabrication of SOI Nano Devices 
506 |a Accès en ligne pour les établissements français bénéficiaires des licences nationales 
506 |a Accès soumis à abonnement pour tout autre établissement 
506 |a Conditions particulières de réutilisation pour les bénéficiaires des licences nationales. https://www.licencesnationales.fr/springer-nature-ebooks-contrat-licence-ln-2017 
520 |a This proceedings volume archives the contributions of the speakers who attended the NATO Advanced Research Workshop on Science and Technology of Semiconductor-On-Insulator Structures and Devices Operating in a Harsh Environment held at the Sanatorium Puscha Ozerna, th th Kyiv, Ukraine, from 25 to 29 April 2004. The semiconductor industry has maintained a very rapid growth during the last three decades through impressive technological achievements which have resulted in products with higher performance and lower cost per function. After many years of development semiconductor-on-insulator materials have entered volume production and will increasingly be used by the manufacturing industry. The wider use of semiconductor (especially silicon) on insulator materials will not only enable the benefits of these materials to be further demonstrated but, also, will drive down the cost of substrates which, in turn, will stimulate the development of other novel devices and applications. In itself this trend will encourage the promotion of the skills and ideas generated by researchers in the Former Soviet Union and Eastern Europe and their incorporation in future collaborations 
650 |a Semiconducteurs 
650 |a Isolants 
650 |a Technologie silicium sur isolant 
650 |a Actes de congrès 
700 1 |a Flandre, Denis.  |4 pbd 
700 1 |a Nazarov, Alexei N.  |4 pbd 
700 1 |a Hemment, Peter LF.  |4 pbd 
711 2 |a NATO Advanced Research Workshop on Science and Technology of Semiconductor-On-Insulator Structures and Devices Operating in a Harsh Environment  |d (2004  |c  :Kiev, Ukraine).  |4 aut 
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