Chemical Vapour Deposition : An Integrated Engineering Design for Advanced Materials
The rapid advancement in chemical vapour deposition (CVD) technology has reached many fields of application, including thin film coating, microelectronics and communications. Chemical Vapour Deposition: An Integrated Engineering Design for Advanced Materials focuses on the application of this techno...
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| Autori principali: | , |
|---|---|
| Natura: | Livre numérique |
| Lingua: | Anglais |
| Pubblicazione: |
London :
Springer London
[20..].
Cham : Springer Nature |
| Edizione: | 1st ed. 2010. |
| Serie: | Engineering Materials and Processes
|
| Accesso online: | Accès sur la plateforme de l'éditeur Accès sur la plateforme Istex Accès Université d'Orléans Accès INSA CVL |
| Nota: |
Archives Springer e-books (Licence nationale) Archives Springer e-books (Licence nationale) |
| Autres localisations: | Voir dans le Sudoc |
| Edition sous un autre format: | • Chemical Vapour Deposition, Texte imprimé, 9781848828933 • Chemical vapour deposition, an integrated engineering design for advanced materials, Yongdong Xu, Xiu-Tian Yan, London, Springer, 2010, 1 vol. (XIV-342 p.), Engineering materials and processes, 978-1-4471-2550-1 • Chemical Vapour Deposition, Texte imprimé, 9781848828957 |