Advanced nanoscale ULSI interconnects : fundamentals and applications
Advanced Nanoscale ULSI Interconnects: Fundamental and Applications brings a comprehensive description of copper based interconnect technology for Ultra Large Scale Integration (ULSI) technology to Integrated Circuit (ICs) application. This book reviews the basic technologies used today for the copp...
সংরক্ষণ করুন:
| অন্যান্য লেখক: | Shacham-Diamand, Yosi (Publishing director), Osaka, Tetsuya (Publishing director), Datta, Madhav (Publishing director), Ohba, Takayuki (Publishing director) |
|---|---|
| বিন্যাস: | Livre numérique |
| ভাষা: | Anglais |
| প্রকাশিত: |
New York, NY :
Springer New York
2009.
Cham : Springer Nature |
| অনলাইন ব্যবহার করুন: | Accès sur la plateforme de l'éditeur Accès sur la plateforme Istex Accès Université d'Orléans Accès INSA CVL |
| টীকা: |
Archives Springer e-books (Licence nationale) Archives Springer e-books (Licence nationale) |
| Autres localisations: | Voir dans le Sudoc |
| Edition sous un autre format: | • Advanced Nanoscale ULSI Interconnects: Fundamentals and Applications, Texte imprimé, 9780387958675 • Advanced Nanoscale ULSI Interconnects: Fundamentals and Applications, Texte imprimé, 9780387959054 • Advanced Nanoscale ULSI Interconnects: Fundamentals and Applications, Texte imprimé, 9781461497448 |
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