Defects in high-k gate dielectric stacks : nano-electronic semiconductor devices : [proceedings of the NATO Advanced Research Workshop on defects in advanced high-k dielectric nano-electronic semiconductor devices, St. Petersburg, Russia, July 11-14, 2005]
The goal of this NATO Advanced Research Workshop (ARW) entitled Defects in Advanced High-k Dielectric Nano-electronic Semiconductor Devices , which was held in St. Petersburg, Russia, from July 11 to 14, 2005, was to examine the very complex scientific issues that pertain to the use of advanced high...
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| Formato: | Livre numérique |
| Idioma: | Anglais |
| Publicado: |
Dordrecht :
Springer Netherlands
[20..].
Cham : Springer Nature |
| Edición: | 1st ed. 2006. |
| Series: | NATO science series. Series II, Mathematics, physics and chemistry
vol. 216 |
| Sujets: | |
| Acceso en liña: | Accès sur la plateforme de l'éditeur Accès sur la plateforme Istex Accès Université d'Orléans Accès INSA CVL |
| Nota: |
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| Autres localisations: | Voir dans le Sudoc |
| Variante du titre: | Proceedings of the NATO Advanced Research Workshop on Defects in Advanced High-K Dielectric Nano-Electronic Semiconductor Devices, St. Petersburg, Russia, from 11 to 14 July 2005 |
| Edition sous un autre format: | • Defects in high-k gate dielectric stacks, nano-electronic semiconductor devices, edited by Evgeni Gusev, Dordrecht, Springer, 2006, 1 vol. (x, 492 p.), NATO science series, 1-4020-4365-1 |