Atomic Scale Characterization and First-Principles Studies of Si N Interfaces
This thesis presents results from a combined atomic-resolution Z-contrast and annular bright-field imaging and electron energy loss spectroscopy in the Scanning Transmission Electron Microscopy, as well as first principles studies of the interfaces between crystalline b Si3N4 and amorphous (i) CeO2-...
Shranjeno v:
| Glavni avtor: | |
|---|---|
| Format: | Livre numérique |
| Jezik: | Anglais |
| Izdano: |
New York, NY :
Springer New York
[20..].
Cham : Springer Nature |
| Izdaja: | 1st ed. 2011. |
| Serija: | Springer Theses, Recognizing Outstanding Ph.D. Research
|
| Online dostop: | Accès sur la plateforme de l'éditeur Accès sur la plateforme Istex Accès Université d'Orléans Accès INSA CVL |
| Sporočilo: |
Archives Springer e-books (Licence nationale) Archives Springer e-books (Licence nationale) |
| Autres localisations: | Voir dans le Sudoc |
| Edition sous un autre format: | • Atomic Scale Characterization and First-Principles Studies of Si N Interfaces, Texte imprimé, 9781461428572 • Atomic Scale Characterization and First-Principles Studies of Si N Interfaces, Texte imprimé, 9781441978165 • Atomic Scale Characterization and First-Principles Studies of Si N Interfaces, Texte imprimé, 9781441978189 |
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| 020 | |a 9781441978172 | ||
| 020 | |a 9781441978172 | ||
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| 082 | |a 620.14 | ||
| 100 | 1 | |a Walkosz, Weronika. | |
| 245 | 1 | 0 | |a Atomic Scale Characterization and First-Principles Studies of Si N Interfaces |c by Weronika Walkosz. |
| 250 | |a 1st ed. 2011. | ||
| 260 | |a New York, NY : |b Springer New York. | ||
| 260 | |a Cham : |b Springer Nature, |c [20..]. | ||
| 490 | 0 | |a Springer Theses, Recognizing Outstanding Ph.D. Research |x 2190-5061 | |
| 500 | |a Archives Springer e-books (Licence nationale) | ||
| 500 | |a Archives Springer e-books (Licence nationale) | ||
| 505 | 1 | |a Silicon Nitride Ceramics Theoretical Methods and Approximations Overview of Experimental Tools Structural Energetics of b Si3N4 (1010) Surfaces Atomic Resolution Study of the Interfacial Bonding at SI3N4/CEO2 Grain Boundaries Atomic Resolution Study of b Si3N4/ SIO2 Interfaces Imagine Bulk a -SI3N4 Conclusions and Future Work Appendices Cited Literature. | |
| 506 | |a Accès en ligne pour les établissements français bénéficiaires des licences nationales | ||
| 506 | |a Accès soumis à abonnement pour tout autre établissement | ||
| 506 | |a Conditions particulières de réutilisation pour les bénéficiaires des licences nationales. https://www.licencesnationales.fr/springer-nature-ebooks-contrat-licence-ln-2017 | ||
| 520 | |a This thesis presents results from a combined atomic-resolution Z-contrast and annular bright-field imaging and electron energy loss spectroscopy in the Scanning Transmission Electron Microscopy, as well as first principles studies of the interfaces between crystalline b Si3N4 and amorphous (i) CeO2-x as well as (ii) SiO2 intergranular film (IGF). These interfaces are of a great fundamental and technological interest because they play an important role in the microstructural evolution and mechanical properties of Si3N4 ceramics used in many high temperature and pressure applications. The main contribution of this work is its detailed description of the bonding characteristics of light atoms, in particular oxygen and nitrogen, at these interfaces, which has not been achieved before. The atomic-scale information on the arrangement of both light and heavy atoms is critical for realistic modeling of interface properties, such as interface strength and ion transport, and will facilitate increased control over the performance of ceramic and semiconductor materials for a wide-range of applications. This Doctoral Thesis has been accepted by the University of Illinois-Chicago, Chicago, USA. | ||
| 776 | 0 | |t Atomic Scale Characterization and First-Principles Studies of Si N Interfaces |b Texte imprimé |z 9781461428572 | |
| 776 | 0 | |t Atomic Scale Characterization and First-Principles Studies of Si N Interfaces |b Texte imprimé |z 9781441978165 | |
| 776 | 0 | |t Atomic Scale Characterization and First-Principles Studies of Si N Interfaces |b Texte imprimé |z 9781441978189 | |
| 856 | 4 | |q PDF |u https://doi.org/10.1007/978-1-4419-7817-2 |z Accès sur la plateforme de l'éditeur | |
| 856 | 4 | |u https://revue-sommaire.istex.fr/ark:/67375/8Q1-T7BMHT6G-G |z Accès sur la plateforme Istex | |
| 856 | 4 | |5 452349901:750616172 |u https://ezproxy.univ-orleans.fr/login?url=https://dx.doi.org/10.1007/978-1-4419-7817-2 |z Accès Université d'Orléans | |
| 856 | 4 | |5 180339901:753974673 |u https://ezproxy.insa-cvl.fr/login?qurl=https://dx.doi.org/10.1007/978-1-4419-7817-2 |z Accès INSA CVL | |
| 997 | |0 968817 |1 Livre numérique |a Ressource numérique |b INSA |b ENSA |c 0/Bibliothèque numérique/ |c 1/Bibliothèque numérique/Autre ressource numérique/ | ||

