Reactive sputter deposition
The use of thin films is continuously expanding. In the family of Physical Vapour Deposition techniques, sputtering is one of the most important over the past 40 years. In this book, all aspects of the reactive magnetron sputtering process, from the discharge up to the resulting thin film growth, ar...
Gorde:
| Egile nagusia: | |
|---|---|
| Beste egile batzuk: | |
| Formatua: | Livre numérique |
| Hizkuntza: | Anglais |
| Argitaratua: |
Berlin, Heidelberg :
Springer Berlin Heidelberg
[20..].
Cham : Springer Nature |
| Edizioa: | 1st ed. 2008. |
| Saila: | Springer Series in Materials Science
109 |
| Sarrera elektronikoa: | Accès sur la plateforme de l'éditeur Accès sur la plateforme Istex Accès Université d'Orléans Accès INSA CVL |
| Oharra: |
Archives Springer e-books (Licence nationale) Archives Springer e-books (Licence nationale) |
| Autres localisations: | Voir dans le Sudoc |
| Edition sous un autre format: | • Reactive sputter deposition, D. Depla, S. Mahieu, Berlin, Springer, 2008, 1 vol. (XVIII- 570 p.), Springer series in materials science, 978-3-540-76662-9 |
| LEADER | 03476nam a22003377a 4500 | ||
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| 008 | 080829q2000 xx ||| |||| 00| 0 eng d | ||
| 009 | PPN127052194 | ||
| 020 | |a 9783540766643 | ||
| 041 | 0 | |a eng | |
| 082 | |a 620.44 | ||
| 100 | 1 | |a Depla, Diederik. | |
| 245 | 1 | 0 | |a Reactive sputter deposition |c edited by Diederik Depla, Stijn Mahieu. |
| 250 | |a 1st ed. 2008. | ||
| 260 | |a Berlin, Heidelberg : |b Springer Berlin Heidelberg. | ||
| 260 | |a Cham : |b Springer Nature, |c [20..]. | ||
| 490 | 0 | |a Springer Series in Materials Science |v 109 |x 2196-2812 | |
| 500 | |a Archives Springer e-books (Licence nationale) | ||
| 500 | |a Archives Springer e-books (Licence nationale) | ||
| 505 | 1 | |a Simulation of the Sputtering Process Electron Emission from Surfaces Induced by Slow Ions and Atoms Modeling of the Magnetron Discharge Modelling of Reactive Sputtering Processes Depositing Aluminium Oxide: A Case Study of Reactive Magnetron Sputtering Transport of Sputtered Particles Through the Gas Phase Energy Deposition at the Substrate in a Magnetron Sputtering System Process Diagnostics Optical Plasma Diagnostics During Reactive Magnetron Sputtering Reactive Magnetron Sputtering of Indium Tin Oxide Thin Films: The Cross-Corner and Cross-Magnetron Effect Reactively Sputter-Deposited Solid Electrolytes and Their Applications Reactive SputteredWide-Bandgap p-Type Semiconducting Spinel AB2O4 and Delafossite ABO2 Thin Films for Transparent Electronics Oxide-Based Electrochromic Materials and Devices Prepared by Magnetron Sputtering Atomic Assembly of Magnetoresistive Multilayers | |
| 506 | |a Accès en ligne pour les établissements français bénéficiaires des licences nationales | ||
| 506 | |a Accès soumis à abonnement pour tout autre établissement | ||
| 506 | |a Conditions particulières de réutilisation pour les bénéficiaires des licences nationales. https://www.licencesnationales.fr/springer-nature-ebooks-contrat-licence-ln-2017 | ||
| 520 | |a The use of thin films is continuously expanding. In the family of Physical Vapour Deposition techniques, sputtering is one of the most important over the past 40 years. In this book, all aspects of the reactive magnetron sputtering process, from the discharge up to the resulting thin film growth, are described in detail, allowing the reader to understand the complete process. Hence, this book gives necessary information for those who want to: - start with reactive magnetron sputtering - understand and investigate the technique - control their sputtering process - tune their existing process, obtaining the desired thin films | ||
| 700 | 1 | |a Mahieu, Stijn. |4 pbd | |
| 776 | 0 | |0 125092431 |t Reactive sputter deposition |f D. Depla, S. Mahieu |c Berlin |n Springer |d 2008 |p 1 vol. (XVIII- 570 p.) |s Springer series in materials science |z 978-3-540-76662-9 | |
| 856 | 4 | |q PDF |u https://doi.org/10.1007/978-3-540-76664-3 |z Accès sur la plateforme de l'éditeur | |
| 856 | 4 | |u https://revue-sommaire.istex.fr/ark:/67375/8Q1-MWK482R1-P |z Accès sur la plateforme Istex | |
| 856 | 4 | |5 452349901:747859388 |u https://ezproxy.univ-orleans.fr/login?url=https://dx.doi.org/10.1007/978-3-540-76664-3 |z Accès Université d'Orléans | |
| 856 | 4 | |5 180339901:750876875 |u https://ezproxy.insa-cvl.fr/login?qurl=https://dx.doi.org/10.1007/978-3-540-76664-3 |z Accès INSA CVL | |
| 997 | |0 940557 |1 Livre numérique |a Ressource numérique |b INSA |b ENSA |c 0/Bibliothèque numérique/ |c 1/Bibliothèque numérique/Autre ressource numérique/ | ||